JPH0257143U - - Google Patents
Info
- Publication number
- JPH0257143U JPH0257143U JP1989065413U JP6541389U JPH0257143U JP H0257143 U JPH0257143 U JP H0257143U JP 1989065413 U JP1989065413 U JP 1989065413U JP 6541389 U JP6541389 U JP 6541389U JP H0257143 U JPH0257143 U JP H0257143U
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- plasma
- reaction gas
- powder processing
- reaction apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012495 reaction gas Substances 0.000 claims description 4
- 238000009700 powder processing Methods 0.000 claims 2
- 239000000843 powder Substances 0.000 claims 1
- 238000007790 scraping Methods 0.000 claims 1
- 238000003756 stirring Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Powder Metallurgy (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989065413U JPH061233Y2 (ja) | 1988-06-24 | 1989-06-06 | プラズマ粉体処理装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63-82908 | 1988-06-24 | ||
| JP8290888 | 1988-06-24 | ||
| JP1989065413U JPH061233Y2 (ja) | 1988-06-24 | 1989-06-06 | プラズマ粉体処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0257143U true JPH0257143U (en]) | 1990-04-25 |
| JPH061233Y2 JPH061233Y2 (ja) | 1994-01-12 |
Family
ID=31718320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989065413U Expired - Lifetime JPH061233Y2 (ja) | 1988-06-24 | 1989-06-06 | プラズマ粉体処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH061233Y2 (en]) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2004112964A1 (ja) * | 2003-06-20 | 2006-07-27 | 株式会社ホソカワ粉体技術研究所 | 粉体処理方法、粉体処理装置、及び、多孔質造粒物の製造方法 |
| CN113122821A (zh) * | 2020-01-15 | 2021-07-16 | 株洲弗拉德科技有限公司 | 一种搅拌式粉体真空气相沉积炉 |
-
1989
- 1989-06-06 JP JP1989065413U patent/JPH061233Y2/ja not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2004112964A1 (ja) * | 2003-06-20 | 2006-07-27 | 株式会社ホソカワ粉体技術研究所 | 粉体処理方法、粉体処理装置、及び、多孔質造粒物の製造方法 |
| JP4580339B2 (ja) * | 2003-06-20 | 2010-11-10 | ホソカワミクロン株式会社 | 粉体処理方法、及び、粉体処理装置 |
| US7905434B2 (en) | 2003-06-20 | 2011-03-15 | Hosokawa Micron Co., Ltd. | Powder processing apparatus |
| CN113122821A (zh) * | 2020-01-15 | 2021-07-16 | 株洲弗拉德科技有限公司 | 一种搅拌式粉体真空气相沉积炉 |
| CN113122821B (zh) * | 2020-01-15 | 2023-05-30 | 株洲弗拉德科技有限公司 | 一种搅拌式粉体真空气相沉积炉 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH061233Y2 (ja) | 1994-01-12 |